In collaborative work, Addison Clear Wave and EV Group demonstrated commercially viable UV-NIL manufacturing processes. SmartNIL® processing of LuxNIL® resins gave the following results. Refractive Index: 1.82 – 1.96 at 633 nm Resolution: 50 nm Height Gain: 0.64 – 0.80 nm average for 25 imprints Download the jointly issued Whitepaper for details of the process Read More…
Category: Nano-Imprint Lithography
High Resolution, High Refractive Index Nano-Imprint Lithography with Sub-nm Height Gain
ACW teamed up with EV Group to demonstrate a new standard of performance for wafer-level high RI UV nano-imprint lithography (UV-NIL) for augmented/virtual/mixed reality applications. Using EV Group’s SmartNIL® process and ACW’s high RI LuxNIL® resins, the team achieved 50 nm resolution imprints with RI as high as 1.96 at 633 nm and sub-nm average Read More…
ACW Releases Photo-cure Stamp Resins for Nanoimprint Lithography (NIL)
Photo Nanoimprint Lithography (P-NIL) promises to be a rapid and low cost methodology for manufacturing optical, electronic and optoelectronic micro-scale and nano-scale devices. One obstacle for the methodology is the high cost of molds or masters that will have a finite lifetime in terms of multiple copies. The work-around for this cost is to use Read More…
ACW High Refractive Index Materials for Nano-Imprint Lithography for AR/VR/MR
High refractive index (RI) materials are employed for production of quality diffractive optical elements (DOE) used in augmented, virtual, and mixed reality (AR/VR/MR) devices and a variety of optical sensors. Higher RI DOEs provide wider fields of view (FOV), and low-cost mass production of DOEs with RIs greater than 1.7 can be accomplished using photo Read More…
Very High Refractive Index Resins for P-NIL Applications
ACW introduces a new line of LuxNIL® very high RI resins for P-NIL VR/AR/MR applications or other thin coatings. These resins are hybrid organic/inorganic, low viscosity formulations containing PGMEA. They are suitable for spin coating, gravure coating, or ink-jetting to give thicknesses of 100 nm to 3 microns after evaporation of the PGMEA. The cured Read More…
Addison Clear Wave Has Updated Its Photo Nanoimprint Lithography (P-NIL) Resins Brochures
ACW has updated its brochures for resins for P-NIL applications. The updated brochures include the results of environmental and thermal shock stress tests on resins coated on glass. The environmental stress tests were 1000 hours at 85 °C and 85% relative humidity. The thermal shock tests were 1000 cycles of 150 °C for 30 minutes Read More…
High Refractive Index (RI) Resins for Bright Diffractive Optical Elements (DOE)
High refractive index (RI) materials are used for diffractive optical elements (DOEs) employed in augmented, virtual, and mixed reality (AR/VR/MR) devices and optical sensors. One cost-effective approach for DOEs with high RI is to use a resin that can be processed rapidly by photo nano-imprint lithography (P-NIL) methods. When the RI exceeds 1.7 at 589 Read More…
Non-Yellowing P-NIL Resin for Diffractive Optical Element (DOE)
Photo nanoimprint lithography (P-NIL) processes are cost effective methods for production of diffractive optical elements (DOE) used in holographic displays. A limiting factor for this method is the environmental stability of the P-NIL resin. If the P-NIL material yellows considerably with aging, the DOE with have limited utility. In automotive applications, for example, the DOE Read More…
BD-400: Automotive Tough P-NIL Resin
Photo-Nanoimprint Lithography (P-NIL or UV-NIL) is a versatile technique for low-cost nanoscale device fabrication with a wide range of applications. As automobiles with increasing numbers of detectors evolve, opportunities for P-NIL fabricated lenses will increase. But, for the automotive industry, P-NIL materials must survive extreme stress conditions required to demonstrate automobile efficacy. BD-400, ACW’s premier Read More…
High Performance Nano-Imprint Lithography Resin
BD-400 is a high-performance photo nano-imprint lithography (P-NIL) resin. In P-NIL, a thin layer of resin is coated on a mold or substrate and cured with UV light to give a positive pattern with resolution at the 10’s to 100’s of nanometer level. BD-400 resin has excellent flow properties and can be spin-coated. Its films Read More…