Category: Nano-Imprint Lithography

Photo Nanoimprint Lithography (P-NIL) promises to be a rapid and low cost methodology for manufacturing optical, electronic and optoelectronic micro-scale and nano-scale devices.  One obstacle for the methodology is the high cost of molds or masters that will have a finite lifetime in terms of multiple copies.  The work-around for this cost is to use Read More…

High refractive index (RI) materials are employed for production of quality diffractive optical elements (DOE) used in augmented, virtual, and mixed reality (AR/VR/MR) devices and a variety of optical sensors.  Higher RI DOEs provide wider fields of view (FOV), and low-cost mass production of DOEs with RIs greater than 1.7 can be accomplished using photo Read More…

ACW has updated its brochures for resins for P-NIL applications.  The updated brochures include the results of environmental and thermal shock stress tests on resins coated on glass.  The environmental stress tests were 1000 hours at 85 °C and 85% relative humidity.  The thermal shock tests were 1000 cycles of 150 °C for 30 minutes Read More…

Photo nanoimprint lithography (P-NIL) processes are cost effective methods for production of diffractive optical elements (DOE) used in holographic displays.  A limiting factor for this method is the environmental stability of the P-NIL resin.  If the P-NIL material yellows considerably with aging, the DOE with have limited utility.  In automotive applications, for example, the DOE Read More…

Photo-Nanoimprint Lithography (P-NIL or UV-NIL) is a versatile technique for low-cost nanoscale device fabrication with a wide range of applications.  As automobiles with increasing numbers of detectors evolve, opportunities for P-NIL fabricated lenses will increase.  But, for the automotive industry, P-NIL materials must survive extreme stress conditions required to demonstrate automobile efficacy.  BD-400, ACW’s premier Read More…

BD-400 is a high-performance photo nano-imprint lithography (P-NIL) resin.  In P-NIL, a thin layer of resin is coated on a mold or substrate and cured with UV light to give a positive pattern with resolution at the 10’s to 100’s of nanometer level.  BD-400 resin has excellent flow properties and can be spin-coated.  Its films Read More…

UV or photo Nano-Imprint Lithography (UV-NIL or P-NIL) is a versatile technique for low-cost nanoscale device fabrication. The precise, direct patterning and repeatable replication of complex three-dimensional nanoscale patterns (submicron, 10’s of nanometers) in a single step make the NIL technique compelling in comparison to other expensive techniques such as e-beam or helium ion beam Read More…