Category: Nano-Imprint Lithography

BD-400: Automotive Tough P-NIL Resin

Photo-Nanoimprint Lithography (P-NIL or UV-NIL) is a versatile technique for low-cost nanoscale device fabrication with a wide range of applications.  As automobiles with increasing numbers of detectors evolve, opportunities for P-NIL fabricated lenses will increase.  But, for the automotive industry, P-NIL materials must survive extreme stress conditions required to demonstrate automobile efficacy.  BD-400, ACW’s premier Read More…

Nanoimprint Lithography Resins

UV or photo Nano-Imprint Lithography (UV-NIL or P-NIL) is a versatile technique for low-cost nanoscale device fabrication. The precise, direct patterning and repeatable replication of complex three-dimensional nanoscale patterns (submicron, 10’s of nanometers) in a single step make the NIL technique compelling in comparison to other expensive techniques such as e-beam or helium ion beam Read More…