Addison Clear Wave offers complete packages for MLA and WLO applications. That includes the UV-NIL resins and PFAS-free working stamp resins. If you are planning a microlens array for co-packaged optics or micro-display project, you can find optically clear, non-yellowing resins with excellent adhesion properties in the brochure below. Contact us with requirements for your Read More…
Category: Nano-Imprint Lithography
Visit ACW at JPCA 2026
ACW will be at the JPCA 2026 Show (June 10-12) in the Tokyo Big Sight at Booth 3F-51. Visit us to discuss adhesive applications in electronics, opto-electronics and photonics or ACW’s imprint and working stamp resins. ACW’s premier adhesive for electronic and photonics applications is A535-AN, a UV-cured epoxy adhesive with high Tg and excellent Read More…
Addison Clear Wave 2026 Nanoimprint Lithography Brochure
See the updated ACW Nanoimprint Lithography (NIL) brochure. Contents: High RI imprint resins for waveguide surface relief grating (SRG) layers with RI up to 2.0 at 589 nm, very low loss values of <0.2 dB/cm at 125 nm thicknesses, and demonstrated printability on conventional equipment. Acrylate and epoxy working stamp resins for high fidelity and low Read More…
Ultra Low Loss High RI NIL Resins for Waveguides
ACW announces release of a new generation of low loss high RI resins for imprinting features on high RI waveguides. The resins have RI at 589 nm ranging from 1.85 to 1.96 with losses as low as 0.1 dB/cm at 457 nm and 60° incidence angle. Contact us at info@addisoncw.com to request samples and discuss Read More…
Protecting High Refractive Index Nano-Imprint Lithography (NIL) Resins from Sunlight Damage by Hermetic Sealing
High refractive index (RI) NIL resins containing titania nano-particles (NPs) can be used for a wide field of view in augmented reality, virtual reality, mixed reality (AR/VR/MR) devices, but their use is limited by their high reactivity in sunlight. ACW now shows that sunlight damage of these NIL resins can be prevented by hermetically sealing Read More…
UV-NIL for augmented reality / virtual reality / mixed reality (AR/VR/MR) waveguides
In collaborative work, Addison Clear Wave and EV Group demonstrated commercially viable UV-NIL manufacturing processes. SmartNIL® processing of LuxNIL® resins gave the following results. Refractive Index: 1.82 – 1.96 at 633 nm Resolution: 50 nm Height Gain: 0.64 – 0.80 nm average for 25 imprints Download the jointly issued Whitepaper for details of the process Read More…
High Resolution, High Refractive Index Nano-Imprint Lithography with Sub-nm Height Gain
ACW teamed up with EV Group to demonstrate a new standard of performance for wafer-level high RI UV nano-imprint lithography (UV-NIL) for augmented/virtual/mixed reality applications. Using EV Group’s SmartNIL® process and ACW’s high RI LuxNIL® resins, the team achieved 50 nm resolution imprints with RI as high as 1.96 at 633 nm and sub-nm average Read More…
ACW Releases Photo-cure Stamp Resins for Nanoimprint Lithography (NIL)
Photo Nanoimprint Lithography (P-NIL) promises to be a rapid and low cost methodology for manufacturing optical, electronic and optoelectronic micro-scale and nano-scale devices. One obstacle for the methodology is the high cost of molds or masters that will have a finite lifetime in terms of multiple copies. The work-around for this cost is to use Read More…
ACW High Refractive Index Materials for Nano-Imprint Lithography for AR/VR/MR
High refractive index (RI) materials are employed for production of quality diffractive optical elements (DOE) used in augmented, virtual, and mixed reality (AR/VR/MR) devices and a variety of optical sensors. Higher RI DOEs provide wider fields of view (FOV), and low-cost mass production of DOEs with RIs greater than 1.7 can be accomplished using photo Read More…
Very High Refractive Index Resins for P-NIL Applications
ACW introduces a new line of LuxNIL® very high RI resins for P-NIL VR/AR/MR applications or other thin coatings. These resins are hybrid organic/inorganic, low viscosity formulations containing PGMEA. They are suitable for spin coating, gravure coating, or ink-jetting to give thicknesses of 100 nm to 3 microns after evaporation of the PGMEA. The cured Read More…