Photo-Nanoimprint Lithography (P-NIL or UV-NIL) is a versatile technique for low-cost nanoscale device fabrication with a wide range of applications. As automobiles with increasing numbers of detectors evolve, opportunities for P-NIL fabricated lenses will increase. But, for the automotive industry, P-NIL materials must survive extreme stress conditions required to demonstrate automobile efficacy. BD-400, ACW’s premier Read More…
Category: Nano-Imprint Lithography
High Performance Nano-Imprint Lithography Resin
BD-400 is a high-performance photo nano-imprint lithography (P-NIL) resin. In P-NIL, a thin layer of resin is coated on a mold or substrate and cured with UV light to give a positive pattern with resolution at the 10’s to 100’s of nanometer level. BD-400 resin has excellent flow properties and can be spin-coated. Its films Read More…
Nanoimprint Lithography Resins
UV or photo Nano Imprint Lithography (UV-NIL or P-NIL) is a versatile technique for low-cost nanoscale device fabrication. The precise, direct patterning and repeatable replication of complex three-dimensional nanoscale patterns (submicron, 10’s of nanometers) in a single step make the NIL technique compelling in comparison to other expensive techniques such as e-beam or helium ion Read More…