Photo Nano-Imprint Lithography (P-NIL)
UV or photo nano-imprint lithography (UV-NIL or P-NIL) is a versatile method for low-cost nano-scale device fabrication. A resin is coated on a substrate, a stamper with patterns is pressed on, and the resin is cured by UV light as illustrated below. The method gives embossed features on plastic, glass, silicon, or metal for many applications including optical storage, diffractive optical elements (DOE), displays, semi-conductor devices. ACW provides low viscosity, high hardness, high Tg, and optically clear resins for accurate nano-scale replications.
ACW | Featured P-NIL Products | Data |
P-NIL resins | Multi-purpose for spin coat process | |
BD-119 | Nano/micro structures, RI589nm = 1.5165, Tg 131 °C | TDS |
BD-218 | Nano/micro structures, RI589nm = 1.506, Tg 120 °C | TDS |
BD-400 | Nano/micro structures, RI589nm = 1.510, Tg 145 °C | TDS |
IP-158 | Nano/micro structures, RI589nm = 1.584, Tg 70 °C | TDS |
PR-1600-CA | Nano/micro structures, RI589nm = 1.600, Tg 89 °C | TDS |
PR-1612 | Nano/micro structures, RI589nm = 1.612, Tg 60 °C | TDS |
Lens resins | Monolithic or wafer-optics lenses | |
L2002-C42 | Microlens arrays, hybrid lens, RI589nm = 1.515, Tg 150 °C, η = 2,800 cps | TDS |
L2002-C56 | Microlens arrays, hybrid lens, RI589nm = 1.513, Tg 145 °C, η = 1,200 cps | TDS |
L2007 | Microlens arrays, hybrid lens, RI589nm = 1.567, Tg 109 °C | TDS |
L2061-B | Microlens arrays, hybrid lens, RI589nm = 1.602, Tg 130 °C | TDS |
To open a PDF containing High RI P-NIL Resins, click the image with the blue title. To open a PDF containing P-NIL Resins for lenses, click the image with the orange title.
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