Photo Nano-Imprint Lithography (P-NIL)

UV or photo nano-imprint lithography (UV-NIL or P-NIL) is a versatile method for low-cost nano-scale device fabrication.   A resin is coated on a substrate, a stamper with patterns is pressed on, and the resin is cured by UV light as illustrated below.  The method gives embossed features on plastic, glass, silicon, or metal for many applications including optical storage, difractive optical elements (DOE), displays, semi-conductor devices.  ACW provides low viscosity, high hardness, high Tg, and optically clear resins for accurate nano-scale replications.

ACW Featured P-NIL Products    Data
P-NIL resins Multi-purpose for spin coat process
BD-119 Nano/micro structures, RI589nm = 1.5165, Tg 131 °C    TDS
BD-218 Nano/micro structures, RI589nm = 1.506, Tg 120 °C    TDS
BD-400 Nano/micro structures, RI589nm = 1.510, Tg 145 °C    TDS
IP-158 Nano/micro structures, RI589nm = 1.584, Tg 70 °C    TDS
PR-1600-CA Nano/micro structures, RI589nm = 1.600, Tg 89 °C    TDS
PR-1612 Nano/micro structures, RI589nm = 1.612, Tg 60 °C    TDS
Lens resins Monolithic or wafer-optics lenses
L2002-C42 Microlens arrays, hybrid lens, RI589nm = 1.515, Tg 150 °C    TDS
L2007 Microlens arrays, hybrid lens, RI589nm = 1.567, Tg 109 °C    TDS
L2061-B Microlens arrays, hybrid lens, RI589nm = 1.602, Tg 130 °C    TDS

To open a PDF containing High RI P-NIL Resins, click the image with the blue title.  To open a PDF containing P-NIL Resins for lenses, click the image with the orange title.