See the updated ACW Nanoimprint Lithography (NIL) brochure. Contents: High RI imprint resins for waveguide surface relief grating (SRG) layers with RI up to 2.0 at 589 nm, very low loss values of <0.2 dB/cm at 125 nm thicknesses, and demonstrated printability on conventional equipment. Acrylate and epoxy working stamp resins for high fidelity and low Read More…
News & Blog
News & Blog
ACW at SPIE AR/VR/MR 2026
ACW will be exhibiting at SPIE AR/VR/MR 2026 at Booth 6428. The exhibition is open on Tuesday, January 20, through Thursday, January 22. If you are attending the conference, stop at our booth to discuss: low loss high RI surface relief grating layer resins for waveguides, sunlight stability of high RI resins containing titania nanoparticles, Read More…
Ultra Low Loss High RI NIL Resins for Waveguides
ACW announces release of a new generation of low loss high RI resins for imprinting features on high RI waveguides. The resins have RI at 589 nm ranging from 1.85 to 1.96 with losses as low as 0.1 dB/cm at 457 nm and 60° incidence angle. Contact us at info@addisoncw.com to request samples and discuss Read More…
Visit ACW at NNT 2025 in San Diego
ACW will be at booth #1 at the NNT 2025 conference in San Diego, October 12-15. Stop by and visit with us to discuss protecting high RI NIL resins from sunlight damage, ACW resins with ultra low optical loss (<0.2 dB/cm), PFAS-free working stamp resins, or any other NIL topic on your mind. Read More…
ACW at JPCA 2025
ACW will be exhibiting at JPCA 2025. The show will be from June 4 to June 6 at the Tokyo Big Sight Exhibition Halls. Visit us at booth 5H-01 to learn more about our adhesives, nano-imprint lithography (NIL) and working stamp resins, and high refractive index resins.
Protecting High Refractive Index Nano-Imprint Lithography (NIL) Resins from Sunlight Damage by Hermetic Sealing
High refractive index (RI) NIL resins containing titania nano-particles (NPs) can be used for a wide field of view in augmented reality, virtual reality, mixed reality (AR/VR/MR) devices, but their use is limited by their high reactivity in sunlight. ACW now shows that sunlight damage of these NIL resins can be prevented by hermetically sealing Read More…
ACW at SPIE AR/VR/MR 2025
ACW will be at the 2025 SPIE AR/VR/MR 2025 conference in San Francisco on January 27-29. Join us for the presentation of our paper on sunlight stability of high RI NIL resins on Monday, January 27, at 8:40 a.m. Download the manuscript. How to find our booth at SPIE: Location: Booth 6329 in the AR/VR/MR Read More…
PFAS-free Working Stamp Resins
ACW offers PFAS-free working stamp resins for both micro- and nano-imprint lithography applications. These materials offer the following advantages: PFAS-free, environmentally friendly and not restricted No anti-stick layer on the working stamp required in the imprint step, thus reducing process steps Excellent chemical resistance, resists etching from aggressive imprint resins and minimizes height gain in Read More…
ACW has the Total Package for UV-NIL for AR/VR/MR: Working Stamp and High RI Resins
ACW has been designing, developing and manufacturing imprint lithography resins for two decades, since back when they were known as 2P resins. Our advances in the areas of working stamps and high refractive index (RI) resins have brought us to the point that we can provide the total package for UV nanoimprint lithography (UV-NIL) applications Read More…
ACW will be at JPCA 2024 in Tokyo and NNT 2024 in Lund, Sweden
JPCA 2024, June 12-14. ACW will have a booth at the 2024 JPCA Show at the Tokyo Big Sight. (JPCA-2024) Stop by to learn about ACW’s products. For optoelectronics applications, ACW will feature low outgas epoxy adhesives used in active alignment. For UV-NIL (nanoimprint lithography), ACW will feature high refractive index NIL resins that now Read More…