News & Blog

News & Blog

Addison Clear Wave’s PFAS-free Epoxy Working Stamp Resins

Addison Clear Wave has released two new PFAS-free epoxy working stamp resins for UV lens molding and similar applications.  Working stamps can be cast on glass backplanes from metal master molds using a conventional anti-stick material.  The working stamps thus made have high water contact angles and can be used with standard imprint resins without Read More…

UV-NIL for augmented reality / virtual reality / mixed reality (AR/VR/MR) waveguides

In collaborative work, Addison Clear Wave and EV Group demonstrated commercially viable UV-NIL manufacturing processes.  SmartNIL® processing of LuxNIL® resins gave the following results. Refractive Index:  1.82 – 1.96 at 633 nm Resolution:  50 nm Height Gain:  0.64 – 0.80 nm average for 25 imprints Download the jointly issued Whitepaper for details of the process Read More…

High Resolution, High Refractive Index Nano-Imprint Lithography with Sub-nm Height Gain

ACW teamed up with EV Group to demonstrate a new standard of performance for wafer-level high RI UV nano-imprint lithography (UV-NIL) for augmented/virtual/mixed reality applications. Using EV Group’s SmartNIL® process and ACW’s high RI LuxNIL® resins, the team achieved 50 nm resolution imprints with RI as high as 1.96 at 633 nm and sub-nm average Read More…

ACW Releases Photo-cure Stamp Resins for Nanoimprint Lithography (NIL)

Photo Nanoimprint Lithography (P-NIL) promises to be a rapid and low cost methodology for manufacturing optical, electronic and optoelectronic micro-scale and nano-scale devices.  One obstacle for the methodology is the high cost of molds or masters that will have a finite lifetime in terms of multiple copies.  The work-around for this cost is to use Read More…

ACW High Refractive Index Materials for Nano-Imprint Lithography for AR/VR/MR

High refractive index (RI) materials are employed for production of quality diffractive optical elements (DOE) used in augmented, virtual, and mixed reality (AR/VR/MR) devices and a variety of optical sensors.  Higher RI DOEs provide wider fields of view (FOV), and low-cost mass production of DOEs with RIs greater than 1.7 can be accomplished using photo Read More…

Very High Refractive Index Resins for P-NIL Applications

ACW introduces a new line of LuxNIL® very high RI resins for P-NIL VR/AR/MR applications or other thin coatings.  These resins are hybrid organic/inorganic, low viscosity formulations containing PGMEA.  They are suitable for spin coating, gravure coating, or ink-jetting to give thicknesses of 100 nm to 3 microns after evaporation of the PGMEA.  The cured Read More…

Adhesives that Survive Solder Reflow

Those working with semiconductors are familiar with solder reflow conditions.  A PCB containing solder and flux is heated to ca. 150 °C (pre-heat), held there for 1-2 minutes (soak), heated to ca. 260 °C, then cooled. As devices are miniaturized, physical clamps holding and aligning components are increasingly replaced with adhesives.  But solder reflow conditions Read More…

Addison Clear Wave Has Updated Its Photo Nanoimprint Lithography (P-NIL) Resins Brochures

ACW has updated its brochures for resins for P-NIL applications.  The updated brochures include the results of environmental and thermal shock stress tests on resins coated on glass.  The environmental stress tests were 1000 hours at 85 °C and 85% relative humidity.  The thermal shock tests were 1000 cycles of 150 °C for 30 minutes Read More…