ACW teamed up with EV Group to demonstrate a new standard of performance for wafer-level high RI UV nano-imprint lithography (UV-NIL) for augmented/virtual/mixed reality applications. Using EV Group’s SmartNIL® process and ACW’s high RI LuxNIL® resins, the team achieved 50 nm resolution imprints with RI as high as 1.96 at 633 nm and sub-nm average height gain for 25 imprints on a single PFAS-free polymer working stamp.
Key Whitepaper Points:
- UV-nanoimprint lithography
- High refractive index resins
- High precision imprints
- Sub-nm height gains
Download the jointly issued Whitepaper for details of the process and resins.