UV Micro- and Nano-Imprint Lithography Resins
ACW offers UV-curable resins suitable for step-and-flash imprint lithography (SFIL) for wafer-level optic lens, high resolution lens, microlens array (MLA) and LED encapsulation. The resins also are suitable for UV nanoimprint lithography (UV-NIL). The cured films have refractive indices in the range of 1.52-1.60 at 589 nm and are optically clear. They are hard with high Tg and are heat stable and compatible with solder reflow conditions. For general information on ACW UV-NIL products, see the brochure below.
Some of the ACW imprint resins are listed in the table below. Typically, the RI can be fine-tuned to customers’ specifications. Check out the properties listed on the data sheets, or contact us at info@addisoncw.com for more information. Specific information for MLA and WLO applications is HERE.
| Product | η (cps, 25 °C) | n589nm | Tg (°C) | Data Sheet |
|---|---|---|---|---|
| IP-158 | 420-500 | 1.58 | 70 | TDS |
| IP-159B | 300-500 | 1.59 | 75 | TDS |
| L2002-C42 | 2,600-3,000 | 1.52 | 150 | TDS |
| L2002-C56 | 1,100-1,300 | 1.51 | 145 | TDS |
| L2061-B | 1,800-2,000 | 1.60 | 130 | TDS |
| PR1600-CA | 350-450 | 1.60 | 89 | TDS |
| PR1612 | 1,650-1,800 | 1.61 | 60 | TDS |