UV Micro- and Nano-Imprint Lithography Resins

ACW offers UV-curable resins suitable for step-and-flash imprint lithography (SFIL) for wafer-level optic lens, high resolution lens, microlens array (MLA) and LED encapsulation.  The resins also are suitable for UV or photo nanoimprint lithography (UV-NIL, P-NIL).  The cured films have refractive indices in the range of 1.52-1.60 at 589 nm and are optically clear.  They are  hard with high Tg and are heat stable and compatible with solder reflow conditions.

Some of the ACW imprint resins are listed in the table below.  Typically, the RI can be fine-tuned to customers’ specifications.  Check out the properties listed on the data sheets, or contact us at info@addisoncw.com for more information.

Product η (cps, 25 °C) n589nm Tg (°C) Data Sheet
IP-158 420-500  1.58 70  TDS
IP-159B 300-500 1.59 75 TDS
L2002-C42 2,600-3,000 1.52 150 TDS
L2002-C56 1,100-1,300 1.51 145 TDS
L2061-B 1,800-2,000 1.60 130 TDS
PR1600-CA 350-450 1.60 89 TDS
PR1612 1,650-1,800 1.61 60 TDS