LuxNIL® High Refractive Index Resins for UV Nanoimprint Lithography

ACW provides very high RI LuxNIL^® resins for UV-NIL applications.  These resins are organic/inorganic hybrids in PGMEA solvent suitable for spin coating or roll-to-roll coating to give, after solvent removal and curing, coatings of 100 nm to 1 micron.  The RIs of LuxNIL^® resins range up to 2.0 at 589 nm and can be tuned to customers’ specifications.  The cured films have very low optical loss, 100% clarity, and 100% transmission, and they survive harsh environmental conditions of 85 °C and 85% RH essentially unchanged.

You can download a White Paper discussing LuxNIL^® resins that was issued jointly by ACW and EV Group by clicking HERE.  That paper details the high resolution and sub-nm height gain per imprint obtained for 25 imprints on a single working stamp.

ACW solved the problem of sunlight reactivity in high RI NIL resins containing titania nano-particles by employing hermetic sealing.  The results are described in a white paper that is available HERE.  This patented technology is available license-free for applications of LuxNIL^® high RI NIL resins.

LuxNIL^® resins have RI up to 2.0 at 589 nm and loss less than 0.10 dB/cm for 100 nm films  See the brochure below for details, and contact us at luxnil@addisoncw.com to discuss your applications.