Wafer-Level Camera, High RI Optical Lens Resins

Optically clear, high refractive index and ultra hard UV-curable resins suitable for UV or photo nanoimprint lithography (P-NIL) or step-and-flash imprint lithography (SFIL) for wafer-level-optic lens, high resolution lens, microlens array (MLA) and LED encapsulations.  The resins have refractive indices from 1.52 to 1.60 at 589 nm.  ACW lens resins are suitable for high throughput imprint technology, are stable to solder reflow at 260 °C, and are non-yellowing in harsh environment conditions of high heat and humidity.  ACW lens resins are used for fabrication of wafer-level camera image sensor modules for mobile phone camera lens applications.

  • Refractive index = 1.52 to 1.60 at 589 nm
  • Optically Clear
  • High depth of cure
  • UV-curable
  • High temperature resistance
  • Solder re-flow friendly
  • Proven products
   Resin η (cps, 25 °C) RI at 589 nm, (25 °C) Data Sheets
L2002-C42 2,600-3,000     1.52   TDS
L2002-C56 1,100-1,300     1.51   TDS
L2007 8,000-10,000     1.57   TDS
L2061-B 1,800-2,000     1.60   TDS

Click on the image to open a downloadable PDF brochure for P-NIL resins for lenses