High brightness diffractive optical elements (DOE) employ high refractive index (RI) materials. A cost-effective approach to these DOEs is to use a high RI resin that can be processed rapidly by photo nano-imprint lithography (P-NIL) methods. ACW has been a leader in developing resins for P-NIL since the methodology was referred to as 2P (for photo polymer) and used for information layers in data storage applications including Blu-Ray discs.
ACW offers a range of P-NIL resins including several that give high RI cured films. IP-158 and PR-1600-CA with cured films’ RI at 25 °C of 1.58 and 1.60, respectively, have been marketed for more than a decade. ACW has now developed a new, higher RI P-NIL resin, PR-1612, which gives a cured film with RI = 1.612 at 589 nm. And, as with IP-158 and PR-1600-CA, the PR-1612 film is beautifully clear in the visible. As seen in the UV-vis-Near IR spectra below, even a 150-micron thick film of PR-1612 absorbs no light in the visible; the loss in transmission in the visible is due entirely to surface reflection calculated from the Fresnel Equation to be 12% total reflection at 400 nm (RI400nm = 1.655).
For more information, check out the data sheets for IP-158, PR-1600-CA, and PR-1612, or click on the image below for a PDF describing P-NIL resins for DOE. Contact us at email@example.com if you are interested in testing these high RI P-NIL resins.
ACW High RI P-NIL Resins
|Resin||η25°C (cps)||RI589nm||Data Sheet|