See the updated ACW Nanoimprint Lithography (NIL) brochure. Contents:
High RI imprint resins for waveguide surface relief grating (SRG) layers with RI up to 2.0 at 589 nm, very low loss values of <0.2 dB/cm at 125 nm thicknesses, and demonstrated printability on conventional equipment.
Acrylate and epoxy working stamp resins for high fidelity and low height gain for multiple imprints.
