Photo Imprint Resins for Nanoimprint Lithography

ACW has a range of photopolymer resins for micro- and nano-replications, photo nanoimprint lithography (P-NIL), and UV-embossing to create embossed features on plastic, glass, silicon, or metal substrates.  The applications include information layer for data storage, light directing features for display films, diffractive optical elements (DOE), and nanometer features on silicon chips.  The cured photopolymer resins have high hardness, high Tg, and dimensional stability under normal operating temperatures.  The resins provide ultra-accurate replicated features from stampers or molds at micrometer to 10’s of nanometer scales.  The uncured resins have low viscosity and are suitable for spin coating.   All of the high RI P-NIL resins are optically clear in the visible.  Click HERE for a brochure describing these resins.

The newest additions to the ACW line are the very high RI LuxNIL® resins.  These resins are organic/inorganic hybrids in PGMEA suitable for spin coating, roll-to-roll coating or ink-jetting to give, after solvent removal, coatings of 100 nm to 3 microns.   The RIs of LuxNIL® resins are 1.6 to 1.8 at 589 nm and can be tuned to customers’ specifications.  Click HERE for an overview of LuxNIL® resins.  Contact us at LuxNIL@addisoncw.com if you are interested in discussing applications of these resins to your AR/VR/MR products.

Product η (cps, 25 °C) Tg (°C) RI (d)* Data Sheets
IP-158 420-500   70 1.584   TDS
BD-218 380-420 120 1.506   TDS
BD-319 500-600   62 1.491   TDS
BD-400 1,200-1,700 139 1.510   TDS
PR-1600-CA 350-450   89 1.600   TDS
PR-1612 1,650-1,800   60 1.612   TDS
PR-1614 3,100-3,700   76 1.614   TDS
LuxNIL® P65    3 – 5 1.65   TDS
LuxNIL® P73    3 – 5 1.73   TDS
LuxNIL® P79    3 – 5 1.79   TDS

*RI of cured resin measured at 589 nm at 25 °C.