Photo Nanoimprint Lithography Resins for Diffractive Optical Elements (DOE)
ACW has a range of photopolymer resins for micro- and nano-replications, photo nanoimprint lithography (P-NIL), and UV-embossing to create embossed features on plastic, glass, silicon, or metal substrates. The applications include information layer for data storage, light directing features for display films, diffractive optical elements (DOE), and nanometer features on silicon chips. The cured photopolymer resins have high hardness, high Tg, and dimensional stability under normal operating temperatures. The resins provide ultra-accurate replicated features from stampers or molds at micrometer to 10’s of nanometer scales. The uncured resins have low viscosity and are suitable for spin coating. The RI of IP-158 matches that of PC, and the RI of BD-319 matches that of PMMA.
The high RI of IP-158 and PR-1600-CA result in a high brightness films. The most recent addition to the ACW high RI P-NIL stable is PR-1612, which has an RI at 489 nm of 1.612. All of the high RI P-NIL resins are optically clear in the visible.
|Product||η (cps, 25 °C)||Tg (°C)||RI (d)*||Data Sheets|
*RI of cured resin measured at 589 nm at 25 °C.